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以過濾式陰極電弧沉積系統合成碳氮薄膜及其鑑定之研究
Thesis

以過濾式陰極電弧沉積系統合成碳氮薄膜及其鑑定之研究

施百勝
Masters, National Tsing Hua University
2001

Abstract

過濾式陰極電弧沉積系統
The purpose of this thesis is to study the properties and synthesis of amorphous carbon nitride films using the filtered cathodic arc evaporation (FCAE) system .Various superior properties of carbon nitride thin films under substrate bias voltages and annealing temperatures have been observed.The Raman spectroscopy showed that all the amorphous carbon nitride films had a graphite structure and sp2 binding distribution ,The ID / IG ratio reached a maximum when substrate bias was controlled at –350 V,then began to decrease when substrate bias increased. It is apparently due to the ion bombardment with higher energy so that carbon nitride bonds were broken to decrease the ID / IG ratio.The strong absorption band of the FTIR spectrum in the range 1330-1560 cm-1 is the evidence of the nitrogen that incorporated into carbon network,when substrate is biased at –350V,where carbon and nitrogen single bond number and dangling bond density reaches the highest. The chemical components of carbon nitride thin film and the calculated N/C ratio were analyzed by XPS. AFM showed that Rrms increased with increasing substrate bias,resulting from the effect of ion bombardment. The distribution of macroparticles was measured by SEM plan view and the thickness of carbon nitride film was examined by SEM cross-section view. The variation of dangling bond density was analyzed by EPR. The acquired Young’s modulous and the recovery ratio was made by nano-indentation. The microstructure of the carbon nitride films was studied by the grazing incident x-ray diffraction;a peak through the comparison with JCPDS database and SAD (Selected area diffraction ) prove the existence of Nano-crystalline diamond structure. The graphitization and thermal stability of carbon nitride films with the annealing process were discussed.

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