Abstract
AbstractSingle phase aluminum nanorods was fabricated by filtered cathodic arc deposition system. SEM showed that typical nanorods are around 100 – 200 nm in diameter and several hundred nm in length. High resolution transmission electron microscopy with electron diffraction study revealed that the structures are of single crystalline. The EDS confirmed that the nanorods contain only the element of aluminum. In this method we are able to synthesize aluminum nanorods directly, quickly (few minutes), and in large-scale (8” wafer). No templates and catalysts was applied and uniformly distributed aluminum nanorods over the whole substrate(3□3 cm2). The distributed aluminum nanorods have density of around 108/cm2-109/cm2.On the other hand, when the aluminum thin film(without aluminum nanorods on the film) was annealed, aluminum whiskers on the aluminum film would form. It is generally accepted that compressive stresses in the film are the cause of whisker growth.