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使用0.5微米LDMOS製程之橫向式MPS元件設計
Thesis

使用0.5微米LDMOS製程之橫向式MPS元件設計

曾瑋倫
Masters, 國立清華大學, 半導體元件及製程產業研發碩士專班
2009

Abstract

蕭特基
Abstract In this thesis, the development of integrated Schottky barrier diode (SBD) in 0.5um LDMOS process technology is described. In order to improve the reverse leakage current, we use the 3D simulation tools Silvaco to analyze the characteristics of SBD. The experimental results are given to confirm our analytic work. According to the measurement characteristics and device structure, we design the equivalent circuit of this work to describe the performance of this MPS Schottky Device.

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