Abstract
Abstract Photonic crystals (PBG) can apply to fabricate many kinds of novel electro-optical devices. Most importantly, it can reduce the volume of these devices substantially and thus will be engaged in highly concentrated integration of electro-optic devices. Owing to the vigorous development of nano-technology, the bandgap region of photonic crystals can be shifted from microwave to infrared or visible light and applications of PBG are more extensively and practically. Although the fabrication of two-dimensional photonic crystals (2-D PCs) is simple by lithography and etching process, the light-wave confinement of 2-D PCs is restricted and may cause large energy-loss. Besides, the boundary of PBG is highly limited by wave- vectors and polarizations. Therefore, 3-D PCs may be the fundamental framework for practical manufacturing of devices. But its fabrication processes are extremely complicated and difficult. In this thesis, we study of fabricating 3-D PCs or 2-D PCs with fine light confinement by general semiconductor process. We mainly use two methods described as below to achieve this goal: Firstly, we use ICP-HDPCVD to improve conventional autocloning method and expect to fabricate 2-D or 3-D PCs by simpler, reproducible and flexible process. Secondly, we use periodically etched on multilayer structures to implement compact diffractive optical devices of 2-D non-classical PCs. We successfully fabricate 2-D and 3-D periodic structures by using these two methods. Moreover we utilized various optical measurements for all kinds of photonic crystals that we fabricated. Many characteristics are obtained and the valuable applications are also analyzed.