Abstract
Direct synthesis of vertically aligned CNFs has been successfully fabricated on display glass substrates at low temperature (< 500 ℃) by inductive couple plasma-enhance chemical vapor deposition (ICP CVD). Such process technique can be easily integrated with micro-fabrication process and can be scaled up for large size substrates. How to decrease the screen effect and turn-on field and increase the uniformity of CNFs is the way to enhance the field emission characteristics. This study used multi-step growth process and plasma treatment to achieve the goal. First, control the density of CNFs by plasma pre-treatment which controlling the size and density of catalytic nanoparticles. Second, diminish the size of catalyst which staying in the tip of CNFs by plasma post-treatment. CNFs exhibit spindt type and increased the adhesion between CNFs and substrate. Then, re-grow small diameter of CNFs on treated catalyst which stay in the tip of CNFs to increase aspect ratio. Optimize the post-treatment and re-growth parameter to enhance the field emission characteristics. This study succeeded to develop multi-step growth process on glass substrate and enhance the field emission characteristics by integrated and optimized to control the size and density of CNFs and decreased turn-on field from 22.68 V / um to 7.16 V / um.