Abstract
The problemes of Semiconductor manufacturing equipment are often due to bottlenecks in original equipment design, As equipment malfunctioned, there ware no sufficient feedback mechanism nor good Humman Machine Interface to provided,etc In process ends,there were no accurate-parametric models to make early warning surveillance, and thus lead production parameters to be offset baseline. Finally,it resulting in a large number of scrapped wafers loss. Therefore, it is nessary to establish a semiconductor device monitoring system to instantly control device status, and let fault detection task easier to reduce unit production costs, improve product quality and enhance the competitiveness of enterprises. In this study, the 8-inch wafer fab equipment were taken as a case. The daily management statistics revealed high failure rate of equipment malfunction. After analyzing the process of machine monitoring systems, a feedback mechanism has to be built to monitor the instantaneous failure of the solenoid valve, In process ends, (Fault Detection and Classification; FDC) fence should be built Bessdes, extra sensor in the equipment should be re-established to monitor parameters related to (Information technology :IT) end models,and thus allow for early warning monitoring The performance before and often establishment were compared and satisfaction of on-line users wereassessed to verify the effect of improvement. The results of this study confirmed that the improvement off process interface and establishment of the protective net may solve real-time monitoring equipment problems and improve product yield and redace equipment engineers working pressure.It significantly improve production efficiency and shorten debug time and provides a reference for future construction planning to enhance the stability of the machine operation.