Abstract
We successfully fabricate metal nanowire and nanodot arrays by a combination of atomic force microscopy nanomachining and lift-off process with the use of a single-layer resist on Si substrates. Various metal nanowires including Au, Cu, Ni and Ti with a smallest width down to 45 nm are created. The advantages of this process are easy-operation, low-cost, and no limitation to the use of a conducting substrate. The localized surface plasmon resonance (LSPR) images and spectra of the metal nanostructures are obtained by using an optical microscope under a dark field mode. For gold nanodots with a size of 65 nm, a single LSPR peak at about 551 nm is observed. Metal nanowires have two peaks due to oscillations in the long axis (width) and the short axis (height).