Abstract
Exfoliation is the main way to produce graphene from graphite, however, the general exfoliation method can’t control the layer number of graphene. In this thesis, we present a novel fabrication method, optical exfoliation, to exfoliate graphene. With this method, layer by layer exfoliate graphene can be approach. By using low power laser, highly oxidizing gas and hot plate, we can precisely control the number of exfoliate layer. The accuracy of exfoliate thickness can reach one atomic thick. Furthermore, cooperate with the laser engraver, we can selectively exfoliate the specified area of multilayer graphene. This optical exfoliation method can layer by layer selectively exfoliate graphene at low temperature, and also maintain the quality of retained graphene.