Abstract
This study presents a tunable nanotemplates of polystyrene-block-poly (methyl methacrylate) (PS-b-PMMA) copolymers, which can self-assembly arranged in a regular periodic nanostructure. Diblock copolymer films (20 nm thick) are spin-cast from toluene solutions onto a gold-coated silicon, and annealing the diblock copolymer film for 15min to 1 hour at 180°C under an applied AC electric field then selectively removed PMMA phase by acetic acid to form a densely packed hexagonal pore structure. The AC electric field was accelerate the speed of assembly of diblock copolymer on a gold-coated silicon substrate and when frequency is 100mHz, this pore was 25nm in diameter and center-to-center distance was 60nm which had better arrangement. Furthermore, this study investigated using metal-assisted chemical etching (MACE) to fabricate nanostructure by using HF/AgNO3 or HF/H2O2 with gold-coated silicon substrate. While the thickness of gold film above 70nm, which could form a flat surface of silicon after etching process. While the thickness of gold was 15nm, which could form a silicon nanowire after etching process. Therefore, the MACE and photolithography process could be integrated to fabricate a structure included complex micro- and nanostructures on surfaces. In addition, we also integrate the process of nanotemplates and MACE to fabricate a 20nm-high nanopillar which has opposite polarity from original template. The assembly of nanotemplate was limited by the surface characteristic, so we continued looking for new method about transferred the pattern of nanotemplate to another substrate.