Abstract
This study focus on the fabrication of nano bionic grating structures in polycrystalline silicon wafer by nucleation of nickel thin film and RIE(reactive ion etching) for solar cell application. The lowest reflection of nano bionic grating structures obtained was 2% in the range of wavelength from 500nm to 1000nm and from 400nm to 1050nm wavelength range, the reflection was below 4%. Extra damage elimination processes using HNO3/HF/H2O and high temperature anneal were carried out in addition to the process flow to enhance the carrier life time. We measured the life time after RIE and damage elimination processes and life time enhanced from 1.43us to 29.25us. Finally, we fabricated poly-Si solar cell with nano bionic grating structures after the process steps such as doping, anti-reflective, passivation coating deposition, screen printer electrode, and co-fired and we achieved an efficiency of 9.26% with a short circuit current (Jsc) of 30mA/cm2, open circuit (Voc) of 0.53V, and fill factor (FF) of 0.53. Key word: Solar, Poly, Grating, Sub-wavelength