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Thesis
奈米3D微影之AZ40XT正光阻製程建立與CMC薄膜分離技術開發
吳陽烽
Masters, 國立清華大學, 奈米工程與微系統研究所
2017
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Abstract
奈米3D微影技術
CMC糖薄膜
正光阻
薄膜分離
Nano 3D lithography
CMC film
Positive photoresist
Film separation
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Title
奈米3D微影之AZ40XT正光阻製程建立與CMC薄膜分離技術開發
Translated title
奈米3D微影之AZ40XT正光阻製程建立與CMC薄膜分離技術開發
Creators
吳陽烽
Contributors
傅建中 (Advisor)
Awarding Institution
國立清華大學, 奈米工程與微系統研究所; Masters
Theses and Dissertations
Masters, 國立清華大學, 奈米工程與微系統研究所
Language
Traditional Chinese
Resource Type
Thesis
Date published
2018
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