Abstract
In this study, we investigated the electrical analysis simulation and fabrication of RF MEMS(Micro Electromechanical System) switches. Except that the theoretical S-parameter has been derived, we also used Ansoft HFSS to simulate and analyze these devices. Besides, parasitic passive devices such as inductance of cantilever or capacitance of actuated plate were discussed how they affect the switches isolation. In this thesis, a process was designed to fabricate these switches, it was easy to realize with four masks. The whole structure include coplanar waveguide (CPW) and actuated membrane was made with Au(using photoresist as sacrificial layer). In order to prevent the substrate loss, we choose high resistance wafer as substrate. Before running the process, the whole procedure was simulated by CoventorWare CAD tool to make sure that the mask had no error. This simulation results could help us to preview the device property and structure.