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尖角穿隧二極體特性分析與量測之研究
Thesis

尖角穿隧二極體特性分析與量測之研究

辜民翔
Masters, 國立清華大學, 電子工程研究所
2013

Abstract

二極體 電場增強 尖角結構 嵌入式記憶體 可靠度 diode Field enhancement tip structure embedded flash process Reliability
This work presents a tip tunneling diode by 0.18µm embedded flash process. The tip structure is employed to create electrical field enhancement effect, resulting in current difference between forward and reverse bias. Thorough, measurement and simulation of the tunneling diodes are included in this work. Significant conduction current through tunneling can be obtained with high enough electric field. Unlike a conventional diode which requires carrier injection into the junction at forward-bias operation, tunneling diode can be advantageous for speed switching. Capacitance is relatively independent of bias voltage. In addition, its IV characteristics remains very stable with temperature change.

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