Abstract
The novel nanofabrication technique such as photolithography, electron beam lithography and imprint lithography was used to manufacture nanodevices and nanostructures. Imprint lithography have been introduced to nanoscale structures fabrication for many years since 1995. Now, we develop a new microwave-accelerated molding method to deform the polymer, when the temperature is increased to the Tg, the resist will start to melt and deform by the mold shape due to capillary force interaction. Microwave heating is a selective and rapid heating process for polar compound, and generally operates at 2.45 GHz. The absorption efficiency of microwave energy for different materials is dependent on the intrinsic dissipation factor. Lower dissipation factor, such as PDMS or quartz, are not easily heated by microwave irradiation. On the contrary, the high dissipation factor materials, such as polymer or resist can be effective heating. This thesis contains four parts. First, we try to study the different resists which one is suitable for microwave-accelerated imprint lithography. Second, we investigate into various soft-baking temperatures for G-line resist. Third, using various heating time and power of microwave to test and to verify the accuracy of pattern in microwave-accelerated imprint lithography. Finally, we use different molds in microwave-accelerated imprint lithography to evaluate the integrity of patterns.