Abstract
Along with the continuous reduction in line-width and line-space, nano-imprint lithography has been gradually emerging into the fabrication of microelectronic and optoelectronic devices. More recently, it has become an important manufacture technology for the next generation technology. Micro-contact printing technology, one of the nano-imprint technologies, has been attractive because of the advantages in large imprint area, soft mold template, low process pressure, and low process temperature without UV curing. Except for the applications in semiconductor industry, it is more applicable for imprinting patterns on glass substrates or lenses in the optophotonic industry compared to other nanoimprint technologies. Moreover, it transfers patterns in a chemical way so that a thin self-assembled monolayer is stably formed with desired patterns; therefore, it is commonly employed for the fabrication of MEMS devices and biochips today. Because of the characteristics of low-cost and high-throughput, the micro-contact printing technology is famous in the nano-imprint technology. In this thesis, it is noted that the control of imprint forces exerted by the press mechanism is the key research topic. Hence, analysis of both control and motion mechanisms for the micro-contact printing equipment is conducted. The imprint forces and pertinent mathematical models have been studied in order to select correct components and theorize the effects of imprinting. Then, verifications on the feasibility of the models have been conducted by experimentation. Finally, it is expected to preview the design and improvement of equipment in early stage so that a complete mechanism of micro-contact printing can be visualized.