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機械壓印對奈米共軛高分子薄膜光電性質之影響: MEH-PPV和P3HT
Thesis

機械壓印對奈米共軛高分子薄膜光電性質之影響: MEH-PPV和P3HT

彭博彥
Masters, 國立清華大學, 材料科學工程學系
2014

Abstract

模具 壓印 MEH-PPV P3HT 光致發光 mold imprint Photoluminescence
The experiment of this study uses the mold with microns (5 um) and sub-micron (0.5 um) pattern-size to imprint on the conjugated polymer, MEH-PPV and P3HT, and the mold of patterns will reproduce onto the film surface of the conjugated polymer. There are several aspects in this study. First, we observe the deformation situation of the imprinted polymer film. And then, we discuss the factors that influence on Photoluminescence (PL) of conjugated polymer after imprinting which caused by the mold size and shape, concentration of the conjugated polymer, initial film thickness, temperature during imprinting, substrate effect, imprinting time and the strength of stress, respectively. Finally, we try to explain the result of the imprinting data by stress relaxation after imprinting and the crystallization of conjugated polymer.

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