Abstract
Abstract A symmetric organic diamine containing the bis[(N,N'-diphenyluredio)-methyl]silane skeleton was designed as a new type of photodegradable unit. Polymerization of this monomer with isophthaloyl dichloride in tetrachloroethane at 100 。 gave polyamides in 90% yield. Upon irradiation by UV light, this photosensitive polyamides underwent fragmentation through main-chain scission. These unprecedented type of polymers possess potential to be developed as new materials for positive photo-lithography and micro-electronics with economic value.