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研製次波長結構之負折射率光子晶體透鏡及太陽能電池抗反射層
Thesis

研製次波長結構之負折射率光子晶體透鏡及太陽能電池抗反射層

洪士庭
Masters, 國立清華大學, 生醫工程與環境科學系
2004

Abstract

負折射率 光子晶體 抗反射層 negative refraction photonic crystal antireflection layer
Owing to the vigorous development of nano-technology, the bandgap region of photonic crystals or electro-optical devices can be shifted from microwave to infrared or visible light and applications of photonic crystals(PBG) are more extensively and practically. Nano-technology can apply to fabricate many kinds of novel electro-optical devices. Most importantly, it can reduce the volume of these devices substantially and thus will be engaged in highly concentrated integration of electro-optical devices. In this thesis, we study three kinds of subwavelength structure electro-optical devices. First, we use HDPCVD(High Density Plasma Chemical Vapor Deposition) to improve conventional autocloning method and expect to fabricate 2-D PCs waveguide by simpler, reproducible and flexible process. Second, we use autocloning method to fabricate the antireflection layer of solar cell. We also discuss negative refraction lens in this study. We successfully fabricate 2-D PCs waveguide and the antireflection layer of solar cell by using autocloning method. We also use 2D FDTD(Finite-difference time-domain) to simulate negative refraction phenomenon of low-index material, and apply to the fabrication of negative refraction lens. Many characteristics of electro-optical devices are obtained and the valuable applications are also analyzed.

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