Abstract
氮化鈦具有高硬度、耐腐蝕及金黃色澤，在本論文中，氮化鈦薄膜鍍覆於軟質的碳鋼料，以突顯其表面改質的效果。由於離子束輔助濺鍍可造成局部加熱的效果，因此利用此方法鍍膜，無須以鈦為中間層，即可在室溫下直接將氮化鈦鍍於碳鋼基板上而具有極佳的性質。另外，也將應用磁控濺鍍的方式鍍覆氮化鈦膜來做比較。以離子束輔助濺鍍法鍍膜，其鍍膜條件如離子束電壓、離子束電流等，可以分別控制。利用此一優點，可以找出一鍍膜之最佳條件。本論文中，即以不同能量的氮離子、鍍膜時間及離子束清潔基板表面之處理時間，來鍍覆氮化鈦薄膜。離子束輔助濺鍍法所得之氮化鈦薄膜具有(111) 的從優取向，其鍍膜速率隨著時間的增長而呈線性的增加。硬度上，利用1000 eV 的離子束能量鍍膜會有較高之硬度值。使用離子源做基材表面處理是離子束輔助濺鍍法的另一優點，適當的處理時間可以改善 鍍膜的黏著性。TiN films were deposited onto carbon steel by ion beam assistedsputtering technique using a broad ion source and a magnetronsource. Due to the local heating effect when the ions bombardthe surface of the surface of the substrate, TiN films can beprepared by ion beam assisted deposition at ambient temperaturewithout the employment of Ti interlayer. Ion beam techniquespermit independent control of the process variables, and offera major advantage in the mechanistic studies of the filmdeposition process. Dif- ferent energies of nitrogen ions,deposition times and cleaning times of substrate surface withion sources were employed to carry out the deposition in anargon atomosphere in this study. TiN films are successfullydeposited with (111) preferred orientation as analyzed with X-ray diffraction. The deposition thickness increa- ses linearlywith the deposition time under a fixed ion energy. With thecoating of TiN films with ion beam assisted deposition, thesurface hardness of carbon steel is increased significantly.The hardness of the TiN films deposited with 1000 eV ion sourceis higher, due to the relatively closed-packed structure andadequate films thickness. The feasibility of pretreatment onthe subs- trate surface by ion beam cleaning brings anotheradvantage of ion beam assisted deposition. The adhesi- on ofthe TiN film is enhanced by appropriate surface cleaning.