Abstract
This thesis presents self-aligned ink flow by integrating inkjet printing technique and heteostructures for the first time to fabricate grid-like matrix which thickness is in the scale of micrometer. Besides fabricating high resolution (~300 dpi) black matrix (BM) of color filters (CFs), this new technique is hopefully applied for manufacturing valued fibrin scaffold, phtodiode separation, and grid-like electrode of flexible photovotaics etc. The superiotities is including: (1) negalegible satellite droplets since self alignment to precisely fabricating highly-uniform microgrids (10 μm), such as BM with high aperture ratio of 74.5%, (2) flexible manufacturing complicated patterns, such as delta-arranged BM, (3) ultra microdosis inkjet droplet (10 pL) combining with highly-uniform microgrids for greatly saving 92% BM material consumption than traditional photolithography, and (4) thickenable microgrids by increasing inkjet printing layers. Diving voltage (17 V ~21 V) for piezoelectric nozzle, droplet volume (1 pL ~10 pL), dotspacing (20 μm ~40 μm), ink droplet (UV epoxy, RGB resists, negative photoresist, commercial carbon black suspension) and substrate surface property (contact angle: 7°~60°) are carefully investigated during this research. Additionally, effective percentage filling area (63%~100%) and grid-like groove filling height (0.7 μm ~2.5 μm) are measured by digital image processing, SEM and optical profiling instrument etc. This study successfully concludes the optimal parametes for inkjet printing and relative processes of self-aligned microgrid with row offset to advance the behaviors of modern CFs. Moreover, this newly-proposed technique is also anticipated applying for other fields, such as bios, photoelectronics, renewable energy.