Abstract
The purpose of this study is to develop a pulsed inductively coupled linear plasma source, and analyze the temporal and spatial behavior of plasma characteristic parameters. In this research, we has successfully developed a pulsed inductively coupled linear plasma source. We modify and use measurement systems for a pulsed plasma source. We measure the temporal and spatial behavior of plasma parameters by using Langmuir probe and measure the rf parameters by using rf impedance meter (VI probe). In the results of rf impedance meter measurement, the magnitude of rf voltage didn't change significantly as the duty cycle or pulsed frequency increases, rf voltage decreases as the pressure increases. The magnitude of rf current didn't change significantly as pulsed frequency increases, rf current decreases as the duty cycle or pressure increases. A spike of the real part rf impedance due to the transition from capacitive to inductive coupling is observed in the beginning of the modulation pulse. In the results of Langmuir probe measurement, plasma density first increases and then decreases if the probe is moved away from the antenna, because there are more diffusion loss near the linear antenna. In the results, the plasma density at pulse mode is higher than that at continuous wave mode when they are operated at the same average power. In pulse mode, the highest average plasma density is 7.87 × 1010 cm-3 (10 mtorr, 70%, 10 kHz ). A spike of electron temperature due to the power increases substantially in the beginning of the modulation pulse. The magnitude of electron temperature has maximum, the electron temperature decreases if the probe is moved away from the antenna. Because there are interference of rf fieid in rf plasma, it make more error in electron temperature.