Abstract
使用X射線駐波螢光分析晶體表面薄膜的結構,首先由 Batterman於1964提出.當X射線入射於晶體之時,會在晶體內部形成兩個同調的行進波, 由於這兩個行進波的疊加效果,遂在晶體內部形成駐波.本實驗主要目的在了解不同厚度下的薄膜對於薄膜晶面上鎳原子排列的次序做一個定量的描述.對於實驗所得之數據,可借由X射線動力繞射理論的分析便能得到不同厚度下的薄膜,其內部晶面上原子排列次序變化的情形在實驗樣品上的選取,我們是以NiSi2/Si(111)為分析的對像.在實驗儀器使用的方面,大致包含日本製Rigaku RU300 LR線焦聚X 射線產生機,俄羅斯製五環繞射儀,ORTEC生產之光譜儀(Si(Li) Detector) 加上一些電子設備及兩部個人電腦加以控制.這套X射線駐波螢光分析儀於今年度組裝完成,並成功的完成測試及分析功作.A new field in the physics of diffraction of hard eleotron-magnetic radiation has arisen and taken shape in the past 20years.It is based on studying and using standing x-ray wavesthat arise in a perfect crytal under conditions of dynamicdiffration.Using the standing wave method, one can determinethe position of impurity atoms implanted in a crystal or thelength of a chemical bond of for monolayer of foreign atomadsorbed on the clear suface of crystal.on our experiment, wechoose the sample of NiSi2/Si(111)to analysis. we want to knowthe structure of the interface.