Abstract
本論文研究偏壓及氮氣分壓對氮化鈦薄膜之微結構及機械性質的影 響.本實驗製程於中空陰極放電式離子鍍著系統中進行, 基材為不鏽鋼.薄 膜之微結構則由X光繞射分析儀及穿透式電子顯微鏡觀察.以電子顯微鏡觀 察薄膜以判定偏壓.氮氣分壓及鈦介層對氮化鈦薄膜微結構的影響;觀察平 面以量測晶粒大小.組成則由二次離子及X光光電子能譜儀量測.薄膜硬度 則由超微硬度機量得.本實驗鍍著之膜硬度範圍由1686至3120kgf/mm2.偏 壓增加促使氮化鈦薄膜(111)優選方向及柱狀結構的成長.不足夠的但氣分 壓降低其結晶性.其中,偏壓影響氮氣分壓顯著.此外,鈦介層(0001)方向出 現使得氮化鈦(111)優選方向更為顯著,起因於其方向上擁有相似之原子堆 積.具有高硬度值之氮化鈦薄膜具較多Ti2N及較小之晶粒尺寸,影響硬度值 之三因素重要性次序分別為Ti2N的出現,晶粒大小及優選方向. This thesis study the effect of operation parameters, bias and nitrogen partial pressure, on the structure and properties of titanium nitride films.The films were grown using hollow cathode discharge ion plating on stainless steel. The structure was studied using X-ray diffraction (XRD) and trans- mission electron microscopy (TEM). The composition of the films was characte-rized using secondary ion mass spectrometer (XPS). The values of hardness were measured using ultramicrohardness tester. The increase in bias enhanced (111) preferred orientation and columnar structure in TiN films. Introducing insuffi- cient nitrogen pressure lowered the crystallinity of the films. The presence of (0001) in Ti interlayer enhances (111) preferred orientation in TiN films owing to the similar stomic packing in the two orientaion. High hardness of TiN film shows with larger amount of Ti2N and smaller gain size. The order of the factors to influnce hardness was the presence of Ti2, grain size, prefer- red orientation.