Abstract
Abstract The thesis is dedicated the comprehensive study of processing parameters by laser beam writer. The purpose of this thesis is to find the parameter sets for optimal optical waveguide device microlithography process. The advantage of computer aid design by laser beam writer is much powerful. We started with the understanding of resist characteristic and established basic process parameters. And, the next step is to focus on the lithogrphy process parameters of laser beam writer. It includes PID controller values, writing speed, laser energy attenuation, repeat writing times and pattern generation rules. The effects of each parameter on the quality of lithgraphy patterns were individually studied. The laser beam writer is much powerful in MEMS microfabrication. This technology can be employed in low cost lithography process.