Abstract
Self-assembled monolayers (SAMs) are organic molecules chemisorbed on a substrate surface by a suitable headgroup and formed a well-ordered densely packed 2-dimensional layer. It provides an easy way to modify the surface properties of metal, semiconductor and oxide surfaces. Recently, an exchanging process of different SAMs grown on gold substrate has attracted a lot of attention. Hence, in order to achieve higher technological impact, the exchange reaction occurs on semiconductor surface will be more desirable. To realize this purpose, we have applied focused soft X-ray and electron beam to pattern silane derived SAM grown on silicon oxide surfaces. The modified surface was then studied by water contact angle, scanning electron microscopy (SEM) and synchrotron radiation based high-resolution X-ray photoelectron spectroscopy (HRXPS). After focused photon and electron beam irradiation, a surface activation procedure was followed to regenerate active surface at the patterned areas. A second SAM with amino functional group was successfully implanted on the patterned areas. This reaction was confirmed by scanning photoelectron microscopy (SPEM) and SEM through gold nanopaticles absorption.