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非晶質矽膜金屬半導體場效電晶體
趙芳慶
Masters, National Tsing Hua University
1983
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Abstract
非晶質矽膜金屬半導體場效電晶體膜沈積結構電漿增強式氮化矽保護層汲極電流電機工程
ELECTRICAL-ENGINEERING
非晶質矽膜金屬─半導體場效電晶體在本論文中提出,包括膜沈積結構、動作原理和製作步驟。非晶質矽膜金屬─半導體場效電晶體己經採用電漿增強式非晶質矽膜當活動層和氮化矽當保護層而製作出來。非晶質矽膜金屬─半導體場效電晶體在空乏模式中動作,並經改變汲極電壓從零到參伏特,汲極電流則從零變到飽和。典型地,汲極飽和電流在無光的情形下是在10-9安培的範圍。當電晶體被照光,汲極飽和電流增加則被觀察到。
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Title
非晶質矽膜金屬半導體場效電晶體
Translated title
非晶質矽膜金屬半導體場效電晶體
Creators
趙芳慶 (Author)
Contributors
葉鳳生 (Advisor)
Awarding Institution
National Tsing Hua University; Masters
Theses and Dissertations
Masters, National Tsing Hua University
Resource Type
Thesis
Language
English
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