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非自然型態之管制圖關鍵影響因素研究-以低溫多晶矽薄膜電晶體液晶顯示器之微影製程為例
Thesis

非自然型態之管制圖關鍵影響因素研究-以低溫多晶矽薄膜電晶體液晶顯示器之微影製程為例

黃正義
Masters, 國立清華大學, 工業工程與工程管理學系碩士在職專班
2008

Abstract

管制圖 低溫多晶矽 微影製程 線寬 重疊精度 Control Chart LTPS Lithography process Coach, Basketball Overlay accuracy
Control chart has been widely implemented in manufacturing for quality management, and its purpose is to monitor the product quality during the manufacturing process. However, caused by key-factors’ variation, Control-chart, collected from actual production process, will appear with special characteristics. Thus, if could identify and improve these key-factors, hidden to contribute the abnormal Control chart, on time, product quality could be improved. Firstly, the differentiation of quality control system between Conventional and LTPS-TFT-LCD industries is discussed; through the discussion, macro quality concept is built. Next, aiming at lithography process, most critical in LTPS-TFT-LCD manufacturing, adopt Ishikawa Diagram to analyze the defect-cause(s), and provide the analysis information for Control chart. Finally, through the real practical case study, the research concentrates on analyzing six abnormal modes in control chart, finding out the critical factors and further discussing the related question.

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