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非電場極化之壓電高分子薄膜製程及應用於可撓性奈米觸壓感測器陣列
Thesis

非電場極化之壓電高分子薄膜製程及應用於可撓性奈米觸壓感測器陣列

陳哲智
Masters, 國立清華大學, 動力機械工程學系
2011

Abstract

氟化三氟聚乙烯 再結晶極化 居禮溫度 溶化溫度 次20 nm奈米草結構
This paper presents piezoelectric polymer films with nanostructures enhance the sensitivity. Instead of electrical-field poled, we poled the poly(vinylidene fluoride-trifluoroethylene) PVDF-TrFE thin film by recrystallized. Compared with electrical-field poled, there are many the advantages of easy process, low cost, and high yield. Combined with Hot-Embossing Nanoimprint Lithography (HE-NIL).We developed the PVDF-TrFE thin film with sub-20 nm nanograss. We used PVDF-TrFE thin film with nanograss applied to flexible nanostructured tactile sensor array. This paper presents recrystallized the PVDF-TrFE flat thin film at different temperature. We used the X-Ray diffraction (XRD) analyzing the β phase of PVDF-TrFE, and the piezoelectric force microscopy (PFM) measuring the negative piezoelectricity. The result showed that recrystallized the PVDF-TrFE at the temperature between the Curie temperature (Tc) the melting temperature (Tm), the degree of crystallinity of β phase and the negative piezoelectricity will be better. We find recrystallized PVDF-TrFE flat thin film at 140 °C for 2 hours is the best parameter for our research, and then combined with sub-20 nm nanostructures in morphology by nanoimprint lithography. We can fabricate the PVDF-TrFE with sub-20 nm nanostructures which have high piezoelectricity and high sensitivity. We used PVDF-TrFE thin film with nanograss applied to flexible nanostructured tactile sensor array. The output voltage of the PVDF-TrFE nanograss is 0.4 V by finger touch which force is about 49 mN. The sensitivity of is 0.0095 V/mN and PVDF-TrFE flat film is 0.0032 V/mN. The response of the developed flexible tactile sensors based on PVDF-TrFE nanograss film is 2.96 times larger than the PVDF-TrFE flat thin film. Comparison with other paper is 11.17 times larger. Key Word: PVDF-TrFE, Recrystallized, Curie temperature, Melting temperature, Sub-20 nanometer high-aspect-ratio nanostructures.

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