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高介電常數介電層在矽與矽鍺基板的電性研究
Thesis

高介電常數介電層在矽與矽鍺基板的電性研究

曾德軒
Masters, 國立清華大學, 工程與系統科學系
2009

Abstract

高介電常數 矽鍺 HIGH-K SiGe
1.The effects of Ti cap stack on Hf base dielectrics in Si MOSFET. Effects of Ti cap stack HfO2 for higher-k MOSFET. The influence of electrical characteristics with / without PDA. The influence of Ti cap stack HfO2 for N、P MOSFET 2.The effects of TaON stack on Hf base SiGe MOSFET. Effects of TaON stack HfO2 for SiGe MOSFET. The influence of electrical characteristics with / without PDA. 3.The effects of TiON stack on Hf base SiGe MOSFET. Effects of TiON stack HfO2 for SiGe MOSFET. The influence of electrical characteristics with / without PDA.

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