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1.3-μm GaInAsN Vertical-cavity surface-emitting lasers by oxide-planarized and surface-relief processes for single-mode operation
Journal article   Peer reviewed

1.3-μm GaInAsN Vertical-cavity surface-emitting lasers by oxide-planarized and surface-relief processes for single-mode operation

Feng-Ming Lee, Chia-Lung Tsai, Chih-Wei Hu, Kun-Fu Huang, Meng-Chyi Wu and Sun-Chien Ko
IEEE Electron Device Letters, Vol.28(2), pp.120-122
02/2007

Abstract

GaInAsN Planar-type vertical-cavity surface-emitting lasers (VCSELs) SiOx planarization process Surface relief
In this letter, we investigate and characterize the 1.3-μ single-mode vertical-cavity surface-emitting lasers (VCSELs) with two GaInAsN strained multiple quantum wells as the active region. Surface relief technique and a thick silicon oxide were used for the spatial mode filtering and the planarization processing, respectively. The VCSELs with a 5-μm-diameter surface-relief aperture and a 12-μm-diameter oxide-confined aperture at room temperature exhibit a threshold current of 3 mA, a slope efficiency of 0.14 mW/mA, a maximum operation temperature of 90 °C and a single-mode behavior. These VCSELs show a maximum light output power of 1 mW for the single fundamental mode with a transverse-mode suppression of more than 30 dB and also show a clear eye-opening feature operated at 2.488 Gb/s and 12.6 mA. © 2007 IEEE.

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