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2.07-kV AlGaN/GaN Schottky Barrier Diodes on Silicon with High Baliga's Figure-of-Merit
Journal article   Peer reviewed

2.07-kV AlGaN/GaN Schottky Barrier Diodes on Silicon with High Baliga's Figure-of-Merit

Chuan-Wei Tsou, Kai-Pin Wei, Yi-Wei Lian and Shawn S. H. Hsu
IEEE Electron Device Letters, Vol.37(1), pp.70-73
01/01/2016

Abstract

Baliga's Figure-of-Merit GaN Schottky barrier diode (SBD) Silicon substrate
In this letter, we demonstrate high-performance AlGaN/GaN Schottky barrier diodes (SBDs) on Si substrate with a recessed-anode structure for reduced turn-on voltage V ON . The impact of the surface roughness after the recessed-anode formation on device characteristics is investigated. An improved surface condition can reduce the leakage current and enhance the breakdown voltage simultaneously. A low turn-on voltage of only 0.73 V can be obtained with a 50-nm recess depth. In addition, the different lengths of Schottky extension acting like a field plate are investigated. A high reverse breakdown voltage of 2070 V and a low specific ON-resistance of 3.8 mΩ cm 2 yield an excellent Baliga's figure of merit of 1127 MW/cm 2 , which can be attributed to the low surface roughness of only 0.6 nm and also a proper Schottky extension of 2 μm to alleviate the peak electric field intensity in the SBDs.

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