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4K Detectors Array for On-Wafer EUV Imaging in Lithography Control Beyond 5-nm Node
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4K Detectors Array for On-Wafer EUV Imaging in Lithography Control Beyond 5-nm Node

Wei Chang, Chien-Ping Wang, Yao-Hung Huang, Burn Jeng Lin, Pin-Jiun Wu, Jiaw-Ren Shih, Yue-Der Chih, Jonathan Chang, Chrong Jung Lin 和 Ya-Chin King
IEEE Transactions on Electron Devices
2023
DOI: https://doi.org/10.1109/TED.2023.3311413

摘要

Couplings Detectors array EUV imaging extreme ultraviolet (EUV) FinFET technologies FinFETs Imaging Logic gates Metals Sensors Ultraviolet sources Electronic Optical and Magnetic Materials Electrical and Electronic Engineering
A 4K detector array for on-wafer extreme ultraviolet (EUV) imaging is first-time demonstrated. The proposed detector array features full FinFET CMOS logic compatibility, compact 1T pixel, high spatial resolution, and battery-less sensing. The in situ stored sensed signal can be accessed through offline nondestructive wafer-level tests. EUV images projected on wafers can be truthfully reflected by readout signals, providing in-tool monitoring of critical parameters in advanced lithographical systems for CMOS technologies beyond 5-nm node.

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