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A 0.26-μ2 U-shaped nitride-based programming cell on pure 90-nm CMOS technology
Journal article   Peer reviewed

A 0.26-μ2 U-shaped nitride-based programming cell on pure 90-nm CMOS technology

Han-Chao Lai, Kai-Yuan Cheng, Ya-Chin King and Chrong-Jung Lin
IEEE Electron Device Letters, Vol.28(9), pp.837-839
2007

Abstract

CMOS one time programming (OTP) Logic nonvolatile memory (NVM) Nitride storage node Source-side injection (SSI)
A novel one time programming (OTP) cell with a nitride-based storage has been developed for advanced programmable logic applications. This cell that is processed by pure logic process and decoupled with transistor gate oxide has a highly stable and extremely wide on/off window. It exhibits a superior disturb immunity in program and read operations. In addition, a very small cell size (0.263 μm 2 ) has been achieved using 90-nm pure CMOS logic process and is scalable in more advanced CMOS logic technologies by eliminating the constraint of transistor gate-oxide thickness. The all new OTP cell has a wide ON/OFF window and a superior writing efficiency by source-side injection programming mechanism. This novel OTP cell is a very promising programmable logic solution, with a fully CMOS-logic-compatible process below the 90-nm node. © 2007 IEEE.

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