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A Novel Drain Design for ESD Improvement of UHV-LDMOS
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A Novel Drain Design for ESD Improvement of UHV-LDMOS

Cheng-Hsu Wu, Jian-Hsing LeeChenhsin Lien
IEEE Transactions on Electron Devices, 卷.62(12), 頁碼.4135-4138
12/2015

摘要

Circular (C) ultrahigh voltage laterally diffused MOS (C-UHV-LDMOS) electrostatic discharge (ESD) highvoltage n-well (HVNW) reduced-surface field (RESURF) UHV Electronic Optical and Magnetic Materials Electrical and Electronic Engineering
This paper investigates the electrostatic discharge (ESD) failure mechanism in the human body model of circular ultrahigh voltage lateral diffused MOS-type devices. Failure occurs due to the current crowding effect at the N+ junction edge of the drain adjacent to the field oxide. Instead of a large single N+ diffusion, a novel drain design with small multidiffusions is proposed to eliminate the current crowding and to enhance its ESD performance.

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