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A Robust Self-Calibrated Dual-RON Paths Gate Driver With Tri-Level Gate Control for Optimized Turn-On of GaN Gate Injection Transistors
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A Robust Self-Calibrated Dual-RON Paths Gate Driver With Tri-Level Gate Control for Optimized Turn-On of GaN Gate Injection Transistors

Xiao-Quan Wu, Yu-Ting Huang, Chi-Yu Chen, Po-Jui Chiu, Chien-Wei Cho, Ke-Horng Chen, Sheng-Hsi Hung 和 Xi Zhu
IEEE transactions on circuits and systems. I, Regular papers, 頁碼.1-12
21/08/2026

摘要

Calibration Current Gallium nitride gate driver Gate drivers gate injection transistor Generative adversarial networks hard switching Joining processes self-calibration Steady-state Switches Temperature trapping effect tri-level gate control Turning Voltage
This paper proposes a GaN-based gate driver optimized for gate injection transistors (GITs), whose current-driven gate behavior renders conventional voltage-driven drivers inefficient. A self-calibrated dual-R ON -path architecture is introduced to meet the unique drive requirements by delivering both high transient turn-on current and low-loss steady-state current. In addition, a tri-level gate-control scheme is employed to handle hard-switching conditions, improving coupling immunity and suppressing third-quadrant conduction in half-bridge operation. Fabricated in a 0.5- μ m GaN process, the proposed driver achieves a peak output current of 1.93 A and supports up to 1200 W in a 400-V boost converter. Experimental results demonstrate up to 2× reduction in driver power loss compared to conventional RC-interface and Schottky-gate drivers. The converter achieves a peak efficiency of 97.62%, while the conduction-loss increase from 50 ° C to 100 ° C is limited to 1.27× , indicating enhanced thermal robustness and reduced power loss.

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