Logo image
A Study of the Nonlinear Capacitance Variation in Inter Level Copper and Low-k Interconnect Structure
期刊文章   同儕審查

A Study of the Nonlinear Capacitance Variation in Inter Level Copper and Low-k Interconnect Structure

Mingte LinYa-Chin King
IEEE Transactions on Device and Materials Reliability
2021

摘要

Capacitance capacitance Capacitors conduction. Cu Dielectrics Ions Leakage currents low-k Metals non-linear Voltage measurement Electronic Optical and Magnetic Materials Safety Risk Reliability and Quality Electrical and Electronic Engineering
The electrical currents and the capacitances of Cu/low-k materials are comprehensively investigated through the inter level finger-shape structures. The carrier hopping conduction mechanism at low voltage range and the Schottky conduction mechanism at high voltage range are proposed to explain the observed the temperature and polarity dependence. Mobile ion current was observed under repeated voltage bias sweeps. The novel variation of voltage dependence of inter level capacitance resulting from to temperature difference is demonstrated for the first time. Dipole and space charge polarizations are found to dominate the capacitance characteristics at low and high temperature respectively. The proposed model of voltage coefficients of capacitance combining both polarization mechanisms well explains the temperature dependence effect on the inter level Cu/low-k capacitors. AC conductance is found to increase as temperature increases, which is explained to be caused by the carrier conduction rather than polarization effect.

相關連結

指標

1 檢視次數

詳細資料

Logo image