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A molded deep‐UV portable conformable masking system
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A molded deep‐UV portable conformable masking system

B.J. Lin, V.W. Chao, K.E. PetrilloB.J.L. Yang
Polymer Engineering & Science, 卷.26(16), 頁碼.1112-1115
1986

摘要

Chemistry (all) Polymers and Plastics Materials Chemistry
A second‐generation capped deep‐UV portable conformable masking system Is described. Two major improvements of this system are; (1) The replacement of the PMMA bottom layer with the PMMA‐MA‐MAN terpolymer which has a higher thermal stability and a higher deep‐UV sensitivity. (2) The application of the mold hardening process to eliminate the “wings” protruding from the novolac‐terpolymer interface, to facilitate a better choice of developers for the bottom layer, and to provide a better refractive index match between the novolac image lines. Copyright © 1986 Society of Plastics Engineers

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