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A single poly-Si gate-all-around junctionless fin field-effect transistor for use in one-time programming nonvolatile memory
Journal article   Open access

A single poly-Si gate-all-around junctionless fin field-effect transistor for use in one-time programming nonvolatile memory

Mu-Shih Yeh, Yung-Chun Wu, Kuan-Cheng Liu, Ming-Hsien Chung, Yi-Ruei Jhan, Min-Feng Hung and Lun-Chun Chen
Nanoscale Research Letters, Vol.9(1)
2014

Abstract

Fin field-effect transistor Flash memory Gate-all-around Junctionless Nonvolatile memory One-time programming Single poly-Si Three-dimensional
This work demonstrates a feasible single poly-Si gate-all-around (GAA) junctionless fin field-effect transistor (JL-FinFET) for use in one-time programming (OTP) nonvolatile memory (NVM) applications. The advantages of this device include the simplicity of its use and the ease with which it can be embedded in Si wafer, glass, and flexible substrates. This device exhibits excellent retention, with a memory window maintained 2 V after 10 4 s. By extrapolation, 95% of the original charge can be stored for 10 years. In the future, this device will be applied to multi-layer Si ICs in fully functional systems on panels, active-matrix liquid-crystal displays, and three-dimensional (3D) stacked flash memory.
url
https://doi.org/10.1186/1556-276X-9-603View
Published (Version of record) Open

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