AI-powered precursor quantification in atmospheric pressure plasma jet thin film deposition via optical emission spectroscopy

Journal article

Plasma Sources Science and Technology, Vol.33(10), p.105015

2024

Abstract

artificial intelligence (AI);atmospheric pressure plasma jet;film thickness;machine learning;optical emission spectroscopy;precursor amount;thin film

1 Record Views

Title: AI-powered precursor quantification in atmospheric pressure plasma jet thin film deposition via optical emission spectroscopy
Creators - without role: 川康丁
Publication Details: Plasma Sources Science and Technology, Vol.33(10), p.105015
Identifiers: 9957773054806774
Academic Unit: Department of Computer Science, College of Electrical Engineering and Computer Science, National Tsing Hua University
Language: English
Resource Type: Journal article