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AI-powered precursor quantification in atmospheric pressure plasma jet thin film deposition via optical emission spectroscopy
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AI-powered precursor quantification in atmospheric pressure plasma jet thin film deposition via optical emission spectroscopy

Mao-Chuan Chen, Yun-Chung Lee, Jia He Tee, 明蒼 李, Chuan-Kang TingJia-Yang Juang
Plasma Sources Science and Technology, 卷.33(10)
2024

摘要

: artificial intelligence (AI), atmospheric pressu

檔案與連結 (1)

url
https://doi.org/10.1088/1361-6595/ad80c6檢視
已出版(紀錄版本) 開放

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1 檢視次數

詳細資料

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