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Adhesion investigation of low-k films system using 4-point bending test
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Adhesion investigation of low-k films system using 4-point bending test

Chang-Chun Lee, Jacky Huang, Shu-Tong ChangWei-Ching Wang
Thin Solid Films, 卷.517(17), 頁碼.4875-4878
07/2009

摘要

4-point bending Adhesion FEA Interfacial crack Thin film Electronic Optical and Magnetic Materials Surfaces and Interfaces Surfaces Coatings and Films Metals and Alloys Materials Chemistry
This research presents a simulation-based methodology to accurately predict interfacial adhesion behaviors of heterostructures. Validation of the proposed approach is achieved through comparison of 4-point bending test results on interfaces of multiple stacked low-k films with those of theoretical solutions from the finite element analysis. Impact induced by the compliance of 4-point bending test system can be neglected using the averaged energy release rate of various crack lengths in simulations. On the basis of precise predictions drawn from the considered analyses, uncertainty of experimental tests for the nano-scale fractured strength could be promptly observed and estimated. © 2009 Elsevier B.V. All rights reserved.

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