An inverse-distance weighting genetic algorithm for optimizing the wafer exposure pattern for enhancing OWE for smart manufacturing

宏鍇 王; Chen-Fu Chien

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An inverse-distance weighting genetic algorithm for optimizing the wafer exposure pattern for enhancing OWE for smart manufacturing

宏鍇王 and Chen-Fu Chien

Applied Soft Computing, Vol.94

2020

Abstract

Semiconductor industry;Yield enhancement;Inverse distance weighting estimation;genetic algorithm (GA);Overall wafer effectiveness (OWE);Total Resource Management (TRM)

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Title: An inverse-distance weighting genetic algorithm for optimizing the wafer exposure pattern for enhancing OWE for smart manufacturing
Creators - without role: 宏鍇王
Chen-Fu Chien
Publication Details: Applied Soft Computing, Vol.94
Identifiers: 9957776249106774
Academic Unit: Executive Cross-Discipline Master Program for Intelligent Manufacturing, Office of Academic Affairs, National Tsing Hua University
Language: English
Resource Type: Journal article

An inverse-distance weighting genetic algorithm for optimizing the wafer exposure pattern for enhancing OWE for smart manufacturing

Abstract

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