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An investigation of electrothermal characteristics on low-temperature polycrystalline-silicon thin-film transistors
Journal article   Peer reviewed

An investigation of electrothermal characteristics on low-temperature polycrystalline-silicon thin-film transistors

Ya-Li Tai, Jam-Wem Lee and Chen-Hsin Lien
IEEE Transactions on Device and Materials Reliability, Vol.10(1), pp.96-99
03/2010

Abstract

Electrostatic discharge (ESD) Electrothermal effects Grain boundaries Low-temperature polycrystalline-silicon thin-film transistor (LTPS TFT)
In this paper, theoretical and experimental analyses have been performed to explore the electrothermal characteristics in low-temperature polycrystalline-silicon thin-film transistors (LTPS TFTs). A theoretical simulation reveals that electrothermal effects strongly influence the performance of LTPS TFTs, particularly under high-current conditions. Measurements show that, under extremely high currents, LTPS devices demonstrate an open-circuit behavior, while the behavior of devices based on single-crystalline silicon films using an SOI CMOS process results in a short-circuit model. In summary, both the simulation and measurements indicate that grain boundaries will degrade the electrothermal properties of the LTPS thin film and suppress reliability in TFT design. © 2010 IEEE.

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