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Angular distribution of the sputtered atoms from TbFeCo targets
Journal article   Open access   Peer reviewed

Angular distribution of the sputtered atoms from TbFeCo targets

Shiuh Chao, Tzuan-Ren Jeng, Vien-Shien Lo, Der-Ray Huang and Tsai-Chu Hsiao
Journal of Applied Physics, Vol.74(9), pp.5354-5359
1993

Abstract

The angular distribution of the sputtered Tb, Fe, and Co atoms from the elemental targets could be described by cos n θ distribution with n=1.90, 0.54, and 1.01 for Tb, Fe, and Co, respectively. For TbFeCo composite targets with mixed elemental and intermetallic compound phases, the overall angular distribution of the sputtered Tb, Fe, and Co atoms from the mixed phases could also be described by the cos n θ distribution function, and the values of the n's were related to the volume percentage of the intermetallic compound content in the composite target. This was not true of the Tb distribution for a target containing high intermetallic compound content. In that sample, an off-normal term has to be added to the cos n θ distribution function. It was found that a composite target with about 23 vol % intermetallic compound would produce a uniform composition distribution of TbFeCo film on the substrate.
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