Abstract
A new type vanadium oxide deposit with a porous, three-dimensional (3-D) network architecture plated at 0.7 V (vs. Ag/AgCl) from 25 mM VOSO 4 with 5 mM H 2 O 2 shows capacitive-like behavior at 250 mV s -1 and C S ≈ 167 F g -1 at 25 mV s -1 in 3 M KCl for pseudocapacitor applications. This work also emphasizes that anodic deposition of vanadium oxide does occur at a potential much more negative to oxygen evolution from aqueous VOSO 4 solutions due to the presence of V 5+ by adding H 2 O 2 . Through the X-ray photoelectron spectroscopic analyses, this oxide deposit, mainly consisting of V 5+ with 11 mol.% V 4+ , shows a hydrous nature. The unique power characteristics of this hydrous vanadium oxide are reasonably attributed to its intrinsic porous and crystalline structure produced by means of this novel anodic deposition process at a potential much more negative to the oxygen evolution reaction. © 2008 Elsevier B.V. All rights reserved.