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Application of electroless Ni-Zn-P film for under-bump metallization on solder joint
Journal article   Peer reviewed

Application of electroless Ni-Zn-P film for under-bump metallization on solder joint

F.C. Tai, K.J. Wang and J.G. Duh
Scripta Materialia, Vol.61(7), pp.748-751
10/2009

Abstract

(Ni,Cu) 3Sn 4 IMC Ni-Zn-P film Thermal stability X-ray diffraction
A ternary Ni-8Zn-8P film was fabricated with alkaline chemical solution by an electroless method, the annealed Ni-8Zn-8P film exhibiting better thermal stability. In the case of the Sn-3Ag-0.5Cu/Ni-8Zn-8P joint, the (Ni,Cu) 3 Sn 4 intermetallic compound can attach well to the Ni-8Zn-8P film after reflow. The line profile of the Zn element showed that the Zn was only distributed within the Ni-8Zn-8P film, indicating that Zn cannot be used as the diffusion barrier for Ni-diffusion to form (Ni,Cu) 3 Sn 4 IMC, in which no Zn was traced. Crown Copyright © 2009.

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