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CMOS-MEMS resonators and oscillators: A review
Journal article   Peer reviewed

CMOS-MEMS resonators and oscillators: A review

Chao-Yu Chen, Ming-Huang Li and Sheng-Shian Li
Sensors and Materials, Vol.30(4), pp.733-756
2018

Abstract

CMOS-MEMS;Foundry-orientated process;Monolithic integration;Oscillator;Post-CMOS process;Resonator Instrumentation,Materials Science (all)
In this paper, we summarize research activities and technological progress in the field of current CMOS-MEMS resonators and oscillators for portable sensor node and timing applications. By employing CMOS-based fabrication technologies, we can monolithically integrate MEMS devices and their associated application-specific integrated circuits (ASICs), thereby enhancing their overall performance as compared with their stand-alone counterparts. Owing to the diversity of post-CMOS processing techniques, in this review, we mainly focus on the devices achieved by so-called foundry-orientated CMOS-MEMS platforms. On the basis of how the mechanical structure is achieved, in the paper we focus on two major strategies:(i)additive back-end-of-line(BEOL)compatible layers and (ii)machining of standard CMOS layers for device fabrication. Given their superior CMOS integration capability, the circuitry design concepts, testing results, and potential merits of state-of-the-art CMOS-MEMS oscillators are also presented.

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