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Cathodoluminescence of the a-C:N films deposited by a filtered cathodic arc plasma system
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Cathodoluminescence of the a-C:N films deposited by a filtered cathodic arc plasma system

W.J. Hsieh, C.C. Lin, U.S. Chen, Y.S. ChangH.C. Shih
Diamond and Related Materials, 卷.14(1), 頁碼.93-97
01/2005

摘要

Amorphous carbon nitride Filtered cathodic arc Optical emissions Electronic Optical and Magnetic Materials Materials Chemistry Surfaces Coatings and Films Surfaces and Interfaces
Amorphous carbon nitride (a-C:N) films were successfully synthesized on silicon using a 90°-bend magnetic filtered cathodic arc plasma (FCAP) system. ESCA analysis demonstrated that the N/C ratios reached 1.08. Many investigations on photoluminescence (PL) spectra of diamondlike carbon films have been performed, but cathodoluminescence (CL) spectra have seldom been discussed. This work investigated a-C:N films using the CL spectra at 300 K. This work presents CL spectra of a-C:N films obtained at 1.5-3.5 eV and verifies luminescence from the a-C:N films in the visible region. The most prominent luminescence in the CL spectra from the a-C:N films has two peaks centered ∼2.67 eV (blue light) and ∼1.91 eV (red light), but the a-C film yielded only the band at ∼1.91 eV. These optical emissions are intrinsic and extrinsic to the a-C:N film and are sensitive to the content of nitrogen. © 2004 Elsevier B.V. All rights reserved.

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