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Characteristics of gate-all-around junctionless Poly-Si TFTs with an ultrathin channel
Journal article   Peer reviewed

Characteristics of gate-all-around junctionless Poly-Si TFTs with an ultrathin channel

Hung-Bin Chen, Chun-Yen Chang, Nan-Heng Lu, Jia-Jiun Wu, Ming-Hung Han, Ya-Chi Cheng and Yung-Chun Wu
IEEE Electron Device Letters, Vol.34(7), pp.897-899
2013

Abstract

Gate-all-around (GAA) junctionless (JL) thin-film transistor ultrathin channel
This letter demonstrates for the first time junctionless (JL) gate-all-around (GAA) poly-Si thin-film transistors (TFTs) with ultrathin channels (2 nm). The subthreshold swing is 61 mV/decade and the ON/OFF current ratio is close to 10 8 because of the excellent gate controllability and ultrathin channel. The JL-GAA TFTs have a low drain-induced barrier lowering value of 6 mV/V, indicating greater suppression of the short-channel effect than in JL-planar TFTs. The cumulative distribution of electrical parameters in JL-GAA is small. Therefore, the proposed JL-GAA TFTs of excellent device characteristics along with simple fabrication are highly promising for future system-on-panel and system-on-chip applications. © 1980-2012 IEEE.

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