Abstract
TiO 2 -SiO 2 mixed films were deposited into silica using ion-beam sputtering technique. The resulting films has a high refractive index as compared to films sputter deposited by other techniques. Increasing the silica concentration and high-temperature annealing resulted in a decrease of the optical absorption characteristic of the mixed films. The appearance of amorphous-polycrystalline anatase phase transition resulted in the increase of surface roughness and thus the scattering loss.